Semiconductor Manufacturing Handbook - Geng, Hwaiyu

Semiconductor Manufacturing Handbook

Hwaiyu Geng

Yayınevi: McGraw Hill

Yayın tarihi: 06/2005

ISBN: 9780071445597

Ciltli | İngilizce | Büyük boy  | 

Tür: Elektrik-Elektronik

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Table of Contents
PART 1: Semiconductor Fundamentals and Basic Materials
BOARD OF REVIEWERS
CONTRIBUTORS
PREFACE
ACKNOWLEDGMENTS
Chapter 1: How Semiconductor Chips Are Made - Hwaiyu Geng, Lin Zhou
Chapter 2: IC Design - Ilsun Park
Chapter 3: Silicon Substrates for Semiconductor Manufacturing - K.V. Ravi
Chapter 4: Copper, Low-k Dielectrics, and Their Reliability - Hazara S. Rathore, Kaushik Chanda
Chapter 5: Fundamentals-Silicide Formation on Si - L.P. Ren, King N. Tu
Chapter 6: Plasma Process Control - David J. Coumou
Chapter 7: Vacuum Technology - Peter Biltoft
Chapter 8: Photomask - Charles Howard
PART 2: Wafer Processing
Chapter 9: Microlithography - Chris A. Mack
Chapter 10: Ion Implantation and Rapid Thermal Processing - Michael Graf
Chapter 11: Wet Etching - Peng Zhang
Chapter 12: Plasma Etching - Shouliang Lai
Chapter 13: Physical Vapor Deposition - Florian Solzbacher
Chapter 14: Chemical Vapor Deposition - Edward J. McInerney
Chapter 15: Epitaxy - Jamal Ramdani, Giovanni Vaccari
Chapter 16: ECD Fundamentals - Tom Ritzdorf, John Klocks
Chapter 17: Chemical Mechanical Planarization - Timothy S. Dyer
Chapter 18: Wet Cleaning - Andrew Machamer
Part 3: Final Manufacturing
Chapter 19: Inspection, Measurement, and Test - Donald W. Blair
Chapter 20: Grinding, Stress Relief, and Dicing - Kazuhisa Arai, Yoshikazu
Kobayashi, Hideaki Otani
Chapter 21: Packaging - Dietrich Tonnies, Michael Topper
Part 4: Nanotechnology, MEMS, and FPD
Chapter 22: Nanotechnology and Nanomanufacturing - Zhong L. Wang
Chapter 23: Fundamentals of Microelectromechanical Systems - Michael A. Huff
Chapter 24: Flat-Panel Display Technology and Manufacturing - David N. Liu
Part 5: Gases and Chemicals
Chapter 25: Specialty Gas and CDA Systems - Wayne D. Curcie
Chapter 26: Waste Gas Abatement Systems - Joseph D. Sweeney
Chapter 27: PFC Abatement - James C. Cox
Chapter 28: Chemical and Slurry Handling Systems - Kristin Cavicchi, Dan Barsness
Chapter 29: Fluid Handling Components for High Purity Liquid Chemicals and Slurries - Charles K. Gould
Chapter 30: Fundamentals of Ultrapure Water - David J. Albrecht
Part 6: Fab Yield, Operations, and Facilities
Chapter 31: Yield Management - Bo Li, Wayne Carriker
Chapter 32: Automated Material Handling System - Clint Harris
Chapter 33: CD Metrology and CD-SEM - Ram Peltinov, Mina Menaker
Chapter 34: Six Sigma - Bruno Scibilia, Yoan Dupret
Chapter 35: Advanced Process Control - Robert H. McCafferty
Chapter 36: Environmental, Health, and Safety (EHS) Considerations in
Semiconductor Fabrication Facilities - Brett J. Davis, Steven R. Trammell
Chapter 37: Plan, Design, and Construction of a FAB - Industrial Design and
Construction
Chapter 38: Cleanroom Design and Construction - Richard V. Pavlotsky, Stephen C. Beck
Chapter 39: Micro-Vibration and Noise Design - Michael Gandreau, Hal Amick
Chapter 40: ESD Controls in Cleanroom Environments - Larry Levit
Chapter 41: Airborne Molecular Contamination - Chris Muller
Chapter 42: Particle Monitoring in Semiconductor Manufacturing - Steven Kochevar, Jerry Gromala
Chapter 43: Wastewater Neutralization Systems - Richard E. Pinkowski
APPENDIX
INDEX

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